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PECVD Plasma Enhanced Chemical vapor Deposition for Graphene Coated on Epoxy Resin

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  • Shipping Timeframes: All orders are processed within 2-5 business days (excluding weekends and holidays). After your order has been processed, the estimated delivery time is before 04 Feb, 2026, depending on customs, Please note that due to high demand, some items may experience longer shipping times, which will be communicated at order confirmation email.
  • Order Processing Time: Please allow 2-5 business days for us to process your order before it is shipped . Orders placed after 16:00 on Fridays, or during weekends and public holidays, will begin processing on the next business day. Processing times may be extended during peak seasons or sales events.
  • Manufacturing Time: Some products needs manufacturing time, the manufacturing process will take approximately 10-30 business days depending on the product. This timeframe may vary depending on the complexity of the product and current demand. but this will be communicated with you during order confirmation.
  • Returns and Exchanges: We offer a 30-day return policy for most items. If you are not completely satisfied with your purchase, you may return it within 30 days of receipt for a refund or exchange. Items must be unused, in their original packaging, and accompanied by proof of purchase. Return shipping costs are the responsibility of the customer, unless the item was damaged or defective upon arrival.
1. What is PECVD Plasma Enhanced Chemical Vapor Deposition?

PECVD stands for Plasma Enhanced Chemical Vapor Deposition, a technique used to deposit thin films of material on a substrate. It utilizes plasma to enhance the chemical reactions, allowing for lower deposition temperatures and improved film quality.

2. What materials can be coated using this device?

This device is primarily designed to create high-quality graphene coatings on epoxy resin surfaces, but it can also be adapted for other materials depending on specific requirements.

3. What is the weight of the PECVD machine?

The PECVD Plasma Enhanced Chemical Vapor Deposition machine weighs 340 kg.

4. What is the maximum reflection power of the device?

The maximum reflection power of the device is 200W.

5. What is the RF frequency stability of the machine?

The RF frequency is 13.56 MHz ±0.005% stability, ensuring precise deposition.

6. How is the machine cooled?

The PECVD machine uses an air cooling system to maintain optimal operating temperatures.

7. What warranty is provided with the device?

The device comes with a three-year warranty for peace of mind.

8. Is the tube size customizable?

Yes, the tube size can be customized to fit specific needs and applications.

9. What are the main applications of this device?

Applications include research in material science, development of advanced composites, coating technologies in electronics, enhancing properties of epoxy resin products, and innovations in nanotechnology.

10. What is the price of the PECVD machine?

The price of the PECVD Plasma Enhanced Chemical Vapor Deposition machine starts at US$ 40,000.

11. Does the machine come with any certifications?

Yes, the device is CE certified, ensuring it meets European safety and performance standards.

12. Who is this device suitable for?

This machine is ideal for laboratories and research facilities that require reliable and robust equipment for innovative material processing applications.

13. What are the key features of this PECVD machine?

Key features include high-quality graphene coatings, automatic matching for easy operation, robust air cooling system, stable RF frequency, customizable tube sizes, and a three-year warranty.

14. Can this device enhance the properties of other materials apart from epoxy resin?

While specifically designed for epoxy resin, it can potentially enhance the properties of other materials depending on the specific application and setup.

15. How does automatic matching work in this device?

Automatic matching simplifies the operation by adjusting the matching network to optimize power transfer and ensure consistent deposition quality.

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