The Plasma Cleaning Plasma Cleaner is suitable for cleaning plastic, metal, and wafers.
This machine can operate using Argon (Ar), Nitrogen (N2), Air, and Oxygen (O2).
The chamber capacity is 5 liters, allowing for effective cleaning of various materials.
The Plasma Cleaning Plasma Cleaner operates at a frequency of 40 KHz.
Yes, it uses advanced plasma technology for cleaning without harmful chemicals, making it environmentally friendly.
The power consumption ranges from 100 to 300 watts.
The dimensions of the Plasma Cleaning Plasma Cleaner are 550mm (L) x 560mm (W) x 400mm (H).
The machine weighs 45 kg, making it a compact yet powerful cleaning solution.
The Plasma Cleaning Plasma Cleaner comes with a one-year warranty for peace of mind.
It is used for cleaning wafers in semiconductor manufacturing, preparing surfaces for bonding, activating surfaces for improved adhesion, degreasing components, and enhancing surface properties.
No, it is versatile and can also clean plastic and metal surfaces in addition to wafers.
Plasma cleaning is more effective as it does not use harmful chemicals and provides thorough cleaning and activation of surfaces.
While the machine is designed for ease of use, some basic training on plasma technology and operational procedures is recommended.
The plasma cleaner generates ionized gas that interacts with the surface, removing contaminants and activating the surface for better adhesion.
Yes, it is designed for use in labs and manufacturing facilities, making it suitable for industrial applications.
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