PECVD stands for Plasma Enhanced Chemical Vapor Deposition, a technique used to deposit thin films of material on a substrate. It utilizes plasma to enhance the chemical reactions, allowing for lower deposition temperatures and improved film quality.
This device is primarily designed to create high-quality graphene coatings on epoxy resin surfaces, but it can also be adapted for other materials depending on specific requirements.
The PECVD Plasma Enhanced Chemical Vapor Deposition machine weighs 340 kg.
The maximum reflection power of the device is 200W.
The RF frequency is 13.56 MHz ±0.005% stability, ensuring precise deposition.
The PECVD machine uses an air cooling system to maintain optimal operating temperatures.
The device comes with a three-year warranty for peace of mind.
Yes, the tube size can be customized to fit specific needs and applications.
Applications include research in material science, development of advanced composites, coating technologies in electronics, enhancing properties of epoxy resin products, and innovations in nanotechnology.
The price of the PECVD Plasma Enhanced Chemical Vapor Deposition machine starts at US$ 40,000.
Yes, the device is CE certified, ensuring it meets European safety and performance standards.
This machine is ideal for laboratories and research facilities that require reliable and robust equipment for innovative material processing applications.
Key features include high-quality graphene coatings, automatic matching for easy operation, robust air cooling system, stable RF frequency, customizable tube sizes, and a three-year warranty.
While specifically designed for epoxy resin, it can potentially enhance the properties of other materials depending on the specific application and setup.
Automatic matching simplifies the operation by adjusting the matching network to optimize power transfer and ensure consistent deposition quality.
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